photoresist mask pattern

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• Photoresist — A photoresist is a light sensitive material used in several industrial processes, such as photolithography and photoengraving to form a patterned coating on a surface. Contents 1 Photoresist categories 1.1 Tone 1.2 Developing light wavelength …   Wikipedia

• SU-8 photoresist — For the heavy Soviet ground attack aircraft, see Sukhoi Su 8 SU 8 Photoresist descriptionSU 8 is a commonly used negative photoresist. It is a very viscous polymer that can be spun or spread over a thickness ranging from 1 micrometer up to 2… …   Wikipedia

• Multiple patterning — is a class of technologies developed for photolithography to enhance the feature density. The simplest case of multiple patterning is double patterning, where a conventional lithography process is enhanced to produce double the expected number of …   Wikipedia

• Double patterning — is a class of technologies developed for photolithography to enhance the feature density. For the semiconductor industry, double patterning is the only lithography technique to be used for the 32 nm and 22 nm half pitch nodes in 2008 2009 and… …   Wikipedia

• Stepper — A stepper is a device used in the manufacture of integrated circuits (ICs) that is similar in operation to a slide projector or a photographic enlarger. Steppers are an essential part of the complex process, called photolithography, that creates… …   Wikipedia

• Ultraviolet — UV redirects here. For other uses, see UV (disambiguation). UVB redirects here. For the mysterious shortwave radio station in Russia, see UVB 76. For other uses, see Ultraviolet (disambiguation). False color image of the Sun s corona as seen in… …   Wikipedia

• Photolithography — For earlier uses of photolithography in printing, see Lithography. For the same process applied to metal, see Photochemical machining. Photolithography (or optical lithography ) is a process used in microfabrication to selectively remove parts of …   Wikipedia

• Contact lithography — Contact lithography, also known as contact printing, is a form of photolithography whereby the image to be printed is obtained by illumination of a photomask in direct contact with a substrate coated with an imaging photoresist layer. Contents 1… …   Wikipedia

• Extreme ultraviolet lithography — (also known as EUV or EUVL ) is a next generation lithography technology using the 13.5 nm EUV wavelength. EUVL opticsEUVL is a significant departure from the deep ultraviolet lithography used today. All matter absorbs EUV radiation. Hence, EUV… …   Wikipedia

• Microelectromechanical systems — (MEMS) (also written as micro electro mechanical, MicroElectroMechanical or microelectronic and microelectromechanical systems) is the technology of very small mechanical devices driven by electricity; it merges at the nano scale into… …   Wikipedia

• Nerve guidance conduit — A nerve guidance conduit (also referred to as an artificial nerve conduit or artificial nerve graft, as opposed to an autograft) is an artificial means of guiding axonal regrowth to facilitate nerve regeneration and is one of several clinical… …   Wikipedia